唐伟忠
近期热点
资料介绍
个人简历
唐伟忠,1955年生,工学博士,教授,博士生导师。1988年毕业于北京科技大学材料科学与工程专业,获工学博士学位;1994年获北京市高等学校青年学科带头人称号;1994-1995年赴德国波鸿-鲁尔大学进修;1998年晋升为教授;2004年赴美国加州大学伯克利国立实验室访问。曾参加、负责国家和省部级科研课题多项,其中包括“高速大面积金刚石膜沉积设备研制(863计划重大项目)”、“光学级金刚石膜制备技术(863计划重大项目)”、“硬质合金工具金刚石涂层及附着力研究(教育部项目、广东省产学研合作研究项目)”、“高电学性能金刚石膜器件(预研项目)”、“高功率电弧等离子体模拟技术研究(自然科学基金项目)”、高热导率微波介电材料研究(国际合作项目)“等。著有《薄膜材料制备原理、技术及应用》一书;发表学术论文100余篇,获国家发明专利10项,获北京市科学进步奖1项。研究领域
1.薄膜材料沉积技术2.金刚石膜材料3.低温等离子体技术及应用近期论文
1. Y.F. Li, X.M. An, X.C. Liu, L. Jiang, P.W. Zhang, H. Guo, Z.L. Sun, H.Z. Zhao, W.Z. Tang, A 915 MHz/75 kW cylindrical cavity type microwave plasma chemical vapor deposition reactor with a ladder-shaped circumferential antenna developed for growing large area diamond films, Diamond & Related Materials 78 (2017) 67–72.2. Y. Liu, M. Ding, J. Su, Y. Li, P. Zhang, X. Lu, W. Tang, Dielectric properties of nitrogen-doped polycrystalline diamond films in Ka band, Diamond & Related Materials 76 (2017) 68–73.3. Y.Q. Liu, M.H. Ding, J.J. Su, H. Ren, X.R. Lu,W.Z. Tang, An investigation on dielectric properties of diamond films in the range of K and Ka band, Diamond & Related Materials 73 (2017) 114–120.4. G. Wang, X. Lu, M. Ding, Y. Liu, W. Tang, B. Zhang, Diamond coatings deposited on cemented carbide substrates with SiC as interlayers: Preparation and erosion resistance tests, Diamond & Related Materials 73 (2017) 105–113.5. J. Su, Y. Li, Y. Liu, M. Ding, W. Tang, Revisiting the gas flow rate effect on diamond films deposition with a new dome-shaped cavity type microwave plasma CVD reactor, Diamond & Related Materials 73 (2017) 99–104.6. Liu Yanqing, Ding Minghui, Su Jingjie, She Jianmin, Tang Weizhong, Measurement of microwave dielectric properties of low loss diamond film at Ka band using the split-cylinder resonator method, Proceedings of 2015 IEEE International Vacuum Electronics Conference, 2015, p.1-2.7. 李义锋, 佘建民, 苏静杰, 唐伟忠, 李效民, 徐小科, 偏压加强MPCVD法 Ir(100)/MgO(100) 基片上金刚石异质外延形核, 人工晶体学报, 44 (2015) 876-901.8. Hei, Hongjun; Ma, Jing; Li, Xiaojing; Yu, Shengwang; Tang, Bin; Shen, Yanyan; Tang, Weizhong, Preparation and performance of chemical vapor deposition diamond coatings synthesized onto the cemented carbide micro-end mills with a SiC interlayer, Surface and Coatings Technology 261(2015)272-277.9. Hei, Hongjun; Yu, Shengwang; Shen, Yanyan; Li, Xiaojing; Ma, Jing; Tang, Bin; Tang, Weizhong, Growth of β-SiC interlayers on WC-Co substrates with varying hydrogen/tetramethylsilane flow ratio for adhesion enhancement of diamond coatings, Surface and Coatings Technology 272 (2015) 78-284.10. Li, Y.F.; Su, J.J.; Liu, Y.Q.; Ding, M.H.; Wang, G.; Tang, W.Z. A circumferential antenna ellipsoidal cavity type MPCVD reactor developed for diamond film deposition, Diamond and Related Materials, 51(2015)24-29.11. 苏静杰, 杨梓, 李义锋, 唐伟忠, 安晓明, 郭辉, 分体圆柱谐振腔法用于金刚石膜微波介电性能测试的研究,无机材料学报, 30 (2015) 751-756.12. Su, J.J.; Li, Y.F.; Ding, M.H.; Li, X.L.; Liu, Y.Q.; Wang, G.; Tang, W.Z., A dome-shaped cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition, Vacuum, 107 (2014) 51-55.13. Hei, Hongjun; Shen, Yanyan; Ma, Jing; Li, Xiaojing; Yu, Shengwang; Tang, Bin; Tang, Weizhong, Effect of substrate temperature on SiC interlayers for diamond coatings deposition on WC-Co substrates, Vacuum, 109 (2014) 15-20.14. Garin, B.M.; Polyakov, V.I.; Rukovishnikov, A.I.; Khomich, A.V.; Parshin, V.V.; Serov, E.A.; Jia, Ch.Ch.; Lu, F.X.; Tang, W.Z., Dielectric loss at millimeter range and temperatures 300-950 K, and electrophysical properties in diamonds grown by the arc plasma jet technology, Progress in Electromagnetics Research Symposium, 2014, 2096-2099.15. Li, Y.F.; Su, J.J.; Liu, Y.Q.; Ding, M.H.; Li, X.L.; Wang, G.; Yao, P.L.; Tang, W.Z., Design of a new TM021 mode cavity type MPCVD reactor for diamond film deposition, Diamond and Related Materials, 44 (2014) 88-94.16. Su, J.J.; Li, Y.F.; Li, X.L.; Yao, P.L.; Liu, Y.Q.; Ding, M.H.; Tang, W.Z., A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films, Diamond and Related Materials, 42 (2014) 28-32.17. 唐伟忠; 丁明清; 李莉; 冯进军, MPCVD金刚石膜沉积技术及金刚石膜材料在微波电真空器件中的应用,真空电子技术,2014(5)12-16.18. J.J. Su et al, Development of cylindrical cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition, paper presented at 19th IEEE International Conference on Plasma Science (ICOPS), IEEE, 2013, p.1-6. 相关热点