郑锦华
近期热点
资料介绍
近期论文
J.Zheng,Y.Chen,C.L.Lin,X.L.Wei, FEM Analysis of Failure Process in Thin Film during Wear Test, Advanced Materials Research,Vols.154-155(2011),pp1689-1694.J.Zheng,K.M.Kato,K.Nakasa, Effect of intermediate layer on wear-delaminating life of low-frictional SiC-2.6mass%Ti film sputter-deposited on titanium substrate, Surface & Coatings Technology,Vols.205(2010),pp2532-2537.J.Zheng, A Study on Effect of Friction Coefficient on Failure Process of Film, Advanced Materials Research,Vols.179-180(2011),pp501-507.J.Zheng,Y.Chen, A Study on Interface Strength of a-Si:H-DLC Film, Advanced Materials Research,Vols.179-180(2011),pp775-780.J.Zheng,C.L.Lin,Y. Chen,X.L. Wei, A Study on Friction and Wear Properties of a-Si:H-DLC Film,Power and Engineering Conference 2010,Scientific Research Publishing, USA,pp395-399.J.Zheng,C.L.Lin,Y.Chen,X.L.Wei, A Study on Friction and Wear Properties of DLC Film Deposited at Room Temperature, Power and Engineering Conference 2010, Scientific Research Publishing, USA, pp382-386.郑锦华,高界面强度类金刚石薄膜材料的常温沉积设备,实用新型专利号: ZL 2010 2 0673327.2(2011).郑锦华,高界面强度类金刚石薄膜材料的常温沉积设备及其方法,发明专利申请号:201010599609.7(2010). 相关热点
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