个人简历

教育背景\r
1979.09－1983.08 北京工业学院（现北京理工大学），光学工程系，本科\r
1983.09－1986.08 北京工业学院（现北京理工大学），光学工程系，硕士\r
1986.09－1989.08 清华大学，精仪系，博士\r
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工作履历\r
1989.09－1992.03 航天部207所，高级工程师\r
1992.04－1993.03 日本工业技术院（现产业技术综合研究所）计量研究院，客员研究员\r
1993.04－1997.09 日本科技厅，科学事业振兴事业团，研究员\r
1997.10－至今　 清华大学精仪系，1998年提升教授

研究领域

主要研究包括大尺寸光栅的制作技术，光栅的离子束刻蚀及实时监测技术，中阶梯光栅的制作，光栅掩膜的无损检测，光栅参数高精度测量等。也包括光栅在计量中的应用，如二维光栅尺，基于光栅的外差调制技术，外差型傅立叶变换光谱仪等。""

近期论文

2022\r
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Chenlu Xu, Yuxuan Zhao, and Lijiang Zeng, Low-stray-light gratings fabricated with scanning exposure method based on Lloyd's mirror for high contrast near-eye display in augmented reality, Applied Optics, Vol. 61, No. 19，5626 (2022)\r
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2021\r
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Yuxuan Zhao , Lijiang Zeng,* and Lifeng Li，Application of broad-beam scanning exposure to fabricate low-wavefront-error holograpphic gratings, Optical Engineering, 60(4),047105 (2021)\r
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2020\r
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Vunam Le, Guanhao Wu* and Lijiang Zeng，Coma optimization in single spherical collimating lens based dual-beam exposure system，Optical Engineering，59(9), 094103 (2020).\r
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Qimeng Wang, Xinyu Mao and Lijiang Zeng, Improved 2D continuously variable output couplers for an exit pupil expander fabricated through ion beam etching, Applied Optics, 59, 6203 (2020)\r
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Vunam Le, Guanhao Wu* and Lijiang Zeng，A single collimation lens based dual-beam exposure system for fabricating long-period grating，Optics Communications 460, 125139 (2020)\r
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Xinyu Mao, Chaoming Li,?, Keqiang Qiu,?, Lijiang Zeng， Lifeng Li, Xinrong Chen, Jianhong Wu, Zhengkun Liu, Shaojun Fu, Yilin Hong，Design and fabrication of 1300-line/mm polarization-independent reflection gratings for spectral beam combining，Optics Communications 458, 124883 (2020)\r
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2019\r
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Xinwei Chen and Lijiang Zeng, Aberration-reduced spherical concave grating holographically recorded by a spherical wave and a toroidal wave for Rowland circle Mounting, Optics Express, 27(3), 3294-3304 (2019)\r
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2018\r
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Xinwei Chen and Lijiang Zeng, Astigmatism-reduced spherical concave grating holographically recorded by a cylindrical wave and a plane wave for Rowland circle mounting, Applied Optics, 57, 257281-06 (2018)\r
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Xinyu Mao and Lijiang Zeng, Design and fabrication of crossed gratings with multiple zero-reference marks for planar encoders, Measurement science and technology, 29, 025204 (2018)\r
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2017\r
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Donghan Ma and Lijiang Zeng, Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes, Chin. Opt. Lett. 15(10), 100501(2017)\r
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Donghan Ma, Shiwei Wang, and Lijiang Zeng, Wavefront aberration of plane diffraction gratings fabricated in a Lloyd's mirror interferometer, J. Micro/Nanolith. MEMS MOEMS 16(2), 023503 (2017)\r
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Donghan Ma, Yuxuan Zhao and Lijiang Zeng，Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment，Scientific reports, 7: 926 | DOI:10.1038/s41598-017-01099-3 (2017)\r
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Hengyan Zhou, Lijiang Zeng，Optical mosaic method for orthogonally crossed gratings by utilizing information about both main periodic directions simultaneously, Optics Communications 385, 181–187 (2017)