个人简历

教育背景\r
2013.09-2018.07，清华大学 机械工程 博士 导师：孟永钢 教授（国家杰青）\r
2016.07-2017.12，加州大学伯克利分校 机械工程 联合培养博士 导师：David Bogy 教授（美国工程院院士）\r
2009.09-2013.06，西南交通大学 机械设计及其自动化 学士\r
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工作履历\r
2018.07-至今 湖南大学机械与运载工程学院 助理教授\r
2016.9-2017.12 加州大学伯克利分校 Research Assistant

研究领域

"""""微纳制造：电子束、离子束、3D打印、全息打印、表面等离子体光刻等微纳制造工艺相关研究\r
光学超表面器件：基于广义折反射定律的第三代光学元件的研究，如超透镜器件、超表面全息投影器件等\r
新型显示及光场调控技术：全息显示、虚拟/增强现实、裸眼3D等\r
人工智能光子学：人工智能算法应用于光学元件的逆向设计相关研究\r
微纳系统中的表界面科学：纳米间隙的光-机-热多物理场耦合问题相关研究"

近期论文

L. Li, J. Zhang, Y. Hu*, S. Wang, P. Yang, H. Duan*, Broadband Polarization-Switchable Multifocal Noninterleaved Metalenses in the Visible, 2021 (Submitted)\r
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Y. Hu, X. Ou, T. Zeng, J. Lai, J. Zhang, X. Li, X. Luo, L. Li, F. Fan*, and H. Duan*，Electrically Tunable Multifunctional All-Dielectric Metasurfaces Integrated with Liquid Crystals in the Visible，Nano Letters, 2021. \r
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P. Dai, Y. Wang, Y. Hu, C. Groot, O. Muskens, H. Duan*, R. Huang*, Accurate Inverse Design of Fabry–Pérot-Cavity-Based Color Filters far beyond sRGB via a Bidirectional Artificial Neural Network, Photonics Research, 2021. \r
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T. Zhang, Z. Shu, L. Zhang, Y. Chen, Z. Feng, Y. Hu, F. Huang, P. Wang, D. Li, Y. Yao, S. Sun*, H. Duan*, Random Nano-fracture Enabled Physical Unclonable Function, Advanced Materials Techonologies, 2021. \r
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Y. Wang, P. Liu, H. Shi, Y. Dai, J. Zhang, J Zhang, Y. Hu, H. Duan, Y.Chen*, Enhancing the Stability of Polymer Nanostructures via Ultrathin Oxides Coating for Nanooptics Device Applications, Nanotechnology, 2021. \r
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Y. Hu*, L. Li#, R. Wang, J. Song, H. Wang, H. Duan, J. Ji, Y. Meng*, High Speed Parallel Plasmonic Direct-Writing Nanolithography using Metasurface-based Plasmonic Lens. Engineering, 2020. (中国工程院院刊，IF=6.495)\r
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Y. Hu, X. Wang, X. Luo, X. Ou, L. Li, Y. Chen, S. Wang, H. Duan*, All-dielectric metasurfaces for polarization manipulation: principles and emerging applications, Nanophotonics, 2020.(特邀综述，IF=7.49)\r
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J. Li, Y. Chen, Y. Hu, H. Duan*, N. Liu*, Magnesium-Based Metasurfaces for Dual-Function Switching between Dynamic Holography and Dynamic Color Display, ACS Nano, 2020, 7(14): 7892-7898.(IF=14.29)\r
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Y. Chen#, Y. Hu#, J. Zhao, Y. Deng, Z. Wang, X. Cheng, D. Lei*, Y. Deng*, H. Duan*, Topology Optimization‐Based Inverse Design of Plasmonic Nanodimer with Maximum Near‐Field Enhancement, Adv. Funct. Mater., 2020, 23(30): 2000642.(材料科学顶刊，IF=14.58)\r
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X. Luo, Y. Hu*, X. Li, Y. Jiang, Y. Wang, P. Dai, Q. Liu, Z. Shu, H. Duan*, Integrated Metasurfaces with Microprints and Helicity‐Multiplexed Holograms for Real‐Time Optical Encryption, Adv. Opt. Mater., 2020, 8(8): 1902020.(光学类一区，IF=7.36，入选ESI高被引论文)\r
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Y. Hu, L. Li, Y. Wang, M. Meng, L. Jin, X. Luo, Y. Chen, X. Li, S. Xiao, H. Wang, Y. Luo, C. Qiu*, H. Duan*, Trichromatic and Tripolarization-Channel Holography with Noninterleaved Dielectric Metasurface, Nano Lett., 2019, 2(20): 994-1002.（纳米技术领域顶级期刊，IF=12.71,入选ESI高被引论文)\r
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W. Wan, W. Qiao*, D. Pu, R. Li, C. Wang, Y. Hu, H. Duan, L.J. Guo, L. Chen*, Holographic Sampling Display Based on Metagratings, iScience, 2020, 1(23): 100773.（Cell子刊，IF=4.447)\r
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J. Ji, J. Chen, P. Xu, J. Li, Y. Hu*, Y. Meng*, Effect of plasmonic lens distribution on flight characteristics in rotational near-field photolithography, J. Appl. Phys., 2019, 18(126): 183101.（IF=2.328)\r
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H. Yang, Z. Chen, Q. Liu, Y. Hu*, H. Duan*, Near‐Field Orbital Angular Momentum Generation and Detection Based on Spin‐Orbit Interaction in Gold Metasurfaces, Advanced Theory and Simulations, 2019, 10(2): 1900133.（IF=2.951）\r
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Y. Hu#, X. Luo#, Y. Chen, Q. Liu, X. Li, Y. Wang, N. Liu, H. Duan*, 3D-Integrated metasurfaces for full-colour holography, Light: Science & Applications, 2019, 1(8): 86.\r
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Y. Hu, H. Wu, Y. Meng*, Y. Wang, D. Bogy, Head flying characteristics in heat assisted magnetic recording considering various nanoscale heat transfer models. J. Appl. Phys. 123, 34303, 2018.(Featured Article，IF=2.328)\r
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Y. Hu, Y. Meng*, Numerical modeling and analysis of plasmonic flying head for rotary near-field lithography technology. Friction 6, 443, 2018.(Back Cover, IF=5.290)\r
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Y. Hu, H. Wu, Y. Meng*, D. B. Bogy, Nanoscale thermal analysis for heat-assisted magnetic recording. J. Appl. Phys. 122, 134303 (2017).（IF=2.328)\r
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J. Ji, Y. Meng*, Y. Hu, J. Xu, S. Li, G. Yang, High-speed near-field photolithography at 1685 nm linewidth with linearly polarized illumination. Opt. Express 25, 17571, 2017.（IF=3.561)\r
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J. Ji, Y. Hu#, Y. Meng, J. Zhang, J. Xu, S. Li, G. Yang, The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system. Nanotechnology 27, 185303, 2016.（IF=3.4)