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邓海
2023-05-10 09:13
  • 邓海
  • 邓海 - 教授-复旦大学-高分子科学系-个人资料

近期热点

资料介绍

个人简历


1984-1988 中山大学 有机合成学士 1990-1992 京都大学 高分子化学硕士 1992-1995 东京工业大学 高分子化学博士 1996-1996 美国阿克隆大学 高分子系博士后 1997-1998 加州大学伯克利分校 化学系博士后 1998-2000 罗门哈斯公司 高级科学家 2001-2013 英特尔公司 主任工程师 2013-2014 TOK美国 Fellow 2015-至今 复旦大学 教 授

研究领域


高分子的立体定向合成 半导体高分子材料的合成及应用 分子玻璃和导向自组装材料的合成及应用

近期论文


Xuemiao Li; Jie Li; Hai Deng, Design and Synthesis of Novel Directed Self-Assembly Block Copolymers for Sub-10 nm Lithography application. CSTIC (Semicon China). 2017, 7919776 Xuemiao Li; Jie Li; Hai Deng, Synthesis and Directed Self-Assembly of Modified PS-b-PMMA for Sub-10 nm Nanolithography. Journal of Photopolymer Science and Technology, 2017, 30 (1) :83-86. Jie Li; Xuemiao Li; Hai Deng, Design and Synthesis of Sub-10 nm DSA Materials. SPIE Advanced Lithography, 2017, 10146. Deng H, ZEOLITE-SOL GEL NANO-COMPOSITE LOW K DIELECTRIC, US # 7,674,390 (2010) Deng H, et al, IMMERSION LIQUIDS FOR IMMERSION LITHOGRAPHY, US # 7,391,501 (2008) Chang SW, Ayothi R, Bratton D, Yang D, Felix N, Cao HB, Deng H, Ober CK, Sub-50 nm Feature Sizes Using Positive Tone Molecular Glass Resists for EUV Lithography, J. Mater. Chem., 2006, 16 (15): 1470. Editor’s Choice in Science: 28 April 2006 , Vol. 312 Silva AD, Lee JK, André X, Feli XMx, Cao HB, Deng H, Ober CK, Study of the Structure− Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography, Chemistry of Materials, 2008, 20 (4): 1606 Kozawa T, Tagawa S, Cao HB, Deng H , Leeson MJ. Acid Distribution in Chemically Amplified Extreme Ultraviolet Resist, Journal of Vacuum Science & Technology B, 2007, 25 (6): 2481 Deng H, Gin DL, Smith R, Polymerizable Lyotropic Liquid Crystals Containing Transition-Metal and Lanthanide Ions: Architectural Control and Introduction of New Properties into Nanostructured Polymers, J. Am. Chem. Soc., 1998, 120: 3522 Deng H, Shiono T, Soga K, Isospecific Polymerization of MMA Initiated by Chiral Zirconocenedimethly/Ph3CB(C6F5)4 in the Presence of Lewis Acid, Macromolecules, 1995, 28: 3067. Cited by G. Odian《Principles of Polymerization》4th edition. P700 & P727 Deng H, Soga K, Isotactic Polymerization of t-Butyl Acrylate with Chiral Zirconocene, Macromolecules,1996, 29: 1847

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