个人简历
学习及工作经历1998.09-2002.06 大连理工大学物理系 应用物理专业 获理学学士学位；2002.09-2007.10 大连理工大学物理系 等离子体物理专业 硕博连读 获理学博士学位；2007.10-2010.06 大连交通大学材料科学与工程学院 光电材料与器件工程技术研究中心 讲师；2010.06-今 大连交通大学材料科学与工程学院 光电材料与器件工程技术研究中心 副教授。进修及访学经历2008.09-2009.03，日本埼玉工业大学先端科学研究所，特聘研究员；2011.09-2012.03，日本埼玉工业大学先端科学研究所，特聘研究员。
研究领域
材料表面与界面、薄膜制备与分析
近期论文
01. Q. Zhang, J. Liu, Y. Cui, W. Ding*, The oxidation process of NiSix film at high temperature in air and the antioxidant effect of SiOxNy/NiSix film, J Mater Sci: Mater Electron, Vol. 26 (2015) 0000, DOI 10.1007/s10854-015-2830-9. (SCI 收录).02. W. Ding, D. Ju*, Y. Guo, K. Tanaka, F. Komori, Formation of linearly linked Fe clusters on Si(111)-7×7-C2H5OH surface, Nanoscale Research Letters, Vol. 9, 377, 2014. (SCI 收录).03. J. Liu, W. Ding*, H. Wang, S. Liu, W. Jiang, C. Liu, N. Wang, W. Chai, The nanocrystalline structure of TiO2 film deposited by DC magnetron sputtering at room temperature, Modern Physics Letters B, Vol. 28, Issue 27, 1450216, 2014. (SCI 收录).04. W. Ding*, L. Li, L. Zhang, D. Ju, S. Peng, W. Chai, An XPS study on the chemical bond structure at the interface between SiOxNy and N doped PET, J. Chemical Physics, Vol. 138, Issue 10, 104706, 2013. (SCI收录)05. H. Liu, L. Li, T. Yao, W. Ding*, D. Ju, W. Chai, The effect of ion source working power on the composition and optical properties of TiO2 films bombarded by N ion beams, Surface & Coatings Technology, Vol. 219, 88-93, 2013. (SCI收录)06. L. Li, H. Liu, W. Ding*, D. Ju, W. Chai, The effect of oxygen ion beam bombardment on the properties of tin indium oxide/polyethylene terephthalate complex, Thin Solid Films, Vol. 545, 365-370, 2013. (SCI收录)07. H. Liu, L. Li, T. Yao, W. Ding*, H. Wang, D. Ju, W. Chai, Study on the optical property and surface morphology of N doped TiO2 film deposited with different N2 flow rate by DCPMS, J. Environmental Science, Vol. 25, Supplement, S54-S58, 2013. (EI收录)08. T. Yao, H. Liu, W. Ding*, D. Ju, W. Chai, The effect of working pressure on the composition and optical properties of TiO2 films bombarded by N ion beams, Materials Science Forum, Vol. 750, 302-305, 2013. (EI收录)09. 张立娜，丁万昱*，巨东英，柴卫平，氧离子束工作压强对PET表面化学键结构及润湿性能的影响，真空科学与技术学报，第33卷，第7期，684-688页，2013. (EI收录)10. W. Ding, S. Ishiguro, R. Ogatsua, D. Ju*, The effect of growth surface morphology on the crystal structure and magnetic property of L10 order PtFe layers deposited by magnetron sputtering, Applied Surface Science, Vol. 258, Issue 20, 7976-7981, 2012. (SCI收录)11. W. Ding*, Y. Okabe, W. Chai, D. Ju, The influence of N ion bombardment on the properties of PET surface and SiNx/PET complex, Surface & Coatings Technology, Vol. 205, Issue 23-24, 5318-5323, 2011. (SCI收录)12. 丁万昱*，王华林，巨东英，柴卫平，O2流量对磁控溅射N掺杂TiO2薄膜成分及晶体结构的影响，物理学报，第60卷，第 2期，028105(1-7)页，2011. (SCI收录)13. W. Ding*, D. Ju, W. Chai, A simple route to synthesize nanocrystalline TiO2 films at room temperature, Materials Letters, Vol. 64, Issue 14, 1634-1637, 2010. (SCI收录)14. W. Ding*, D. Ju, W. Chai, The effect of working pressure on the chemical bond structure and hydrophobic properties of PET surface treated by N ion beams bombardment, Applied Surface Science, Vol. 256, Issue 22, 6876-6880, 2010. (SCI收录)15. W. Ding*, J. Xu, W. Lu，X. Deng, C. Dong, Influence of N2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering, Thin Solid Film, Vol. 518, Issue 8, 2077-2081, 2010. (SCI收录)16. 张粲，丁万昱*，王华林，柴卫平，O2/Ar比例对直流脉冲磁控溅射制备TiO2薄膜光催化性能的影响，真空科学与技术学报，第30卷，第2期，106-110页，2010. (EI收录)17. W. Y. Ding*, J. Xu, W. Q. Lu, X. L. Deng, C. Dong, Ultra-thin a-SiNx protective overcoats for hard disks and read/write heads, Chinese Physics B, Vol. 18, Issue 4, 1570-1573, 2009. (SCI收录)18. W. Ding*, J. Xu, W. Lu, X. Deng, C. Dong, The effect of N2 flow rate on discharge characteristics of microwave electron cyclotron resonance plasma, Physics of Plasmas, Vol. 16, Issue 5, 053502- 053506, 2009. (SCI收录)19. 丁万昱*，徐军，陆文琪，邓新绿，董闯，微波ECR磁控溅射制备SiNx薄膜的XPS结构研究，物理学报，第58卷，第6期，4109-4116页，2009. (SCI收录)20. 丁万昱*，王华林，苗壮，张俊计，柴卫平，沉积参数对SiNx薄膜结构及阻透性能的影响，物理学报，第58卷，第1期，432-437页，2009. (SCI收录)
